Albert Theuwissen Reviews ISSCC 2020 - Part 2 - Hallo friendsCAR ON REPIYU, In the article you read this time with the title Albert Theuwissen Reviews ISSCC 2020 - Part 2, We have prepared this article for you to read and retrieve information therein. Hopefully the contents of postings Article car review, Article mobile review, We write this you can understand. Alright, good read.

Title : Albert Theuwissen Reviews ISSCC 2020 - Part 2
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Albert Theuwissen Reviews ISSCC 2020 - Part 2

The second part of the review starts with Samsung small-pixel paper "A 1/2.65inch 44Mpixel CMOS image sensor with 0.7 um pixels fabricated in advanced full-depth deep-trench isolation technology" by HyunChul Kim, Jongeun Park, Insung Joe, Doowon Kwon, Joo Hyoung Kim, Dongsuk Cho, Taehun Lee, Changkyu Lee, Haeyong Park, Soojin Hong, Chongkwang Chang, Jingyun Kim, Hanjin Lim, Youngsun Oh, Yitae Kim, Seungjoo Nah, Sangill Jung, Jaekyu Lee, JungChak Ahn, Hyeongsun Hong, Kyupil Lee, and Ho-Kyu Kang. The paper explains Bosch HART process used to create thin vertical DTI with large aspect ratio:

Artilux paper "An up-to-1400 nm 500MHz Demodulated time-of-flight image sensor on a Ge-on-Si platform" by C.-L. Chen, S.-W. Chu, B.-J. Chen, Y.-F. Lyu, K.-C. Hsu, C.-F. Liang, S.-S. Su, M.-J. Yang, C.-Y. Chen, S.-L. Cheng, H.-D. Liu, C.-T. Lin, K. P. Petrov, H.-W. Chen, K.-C. Chu, P.-C. Wu, P.-T. Huang, N. Na, and S.-L. Chen reports 50% QE at 1550nm for a Ge-on-Si stacked BSI sensor:

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